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he jin zhu gang de xian wei pian xi yu jing jian cui xing
Author(s): Xu Yongbo Yu Shang Chang Tianyi Yiao Zhichen Luo Yinhua
Pages: 38-
43
Year: 1983
Issue:
3
Journal: Materials Science and Technology
Keyword: 晶间脆性; 杂质元素; 显微偏析; 沿晶脆性断裂; 奥氏体晶界; 低合金铸钢; 离子探针; 沿晶断裂; 俄歇电子能谱仪; 工艺试验;
Abstract: 对两种低合金铸钢的沿晶脆性断裂现象进行了研究,结果表明,两种脆化材料的断口均为沿晶脆性断裂。在沿晶面上观察到生长完善的枝晶结构和疏松露头。透射电镜观察与电子衍射分析确认,有薄膜状第二相沿晶间和枝晶沉淀。用俄歇电子能谱仪和离子探针测定了脆性断裂面上杂质元素的偏析,结果表明,沿晶表面上存在H,C,O,N和S的偏析,尤其以O的偏析为甚。经冶炼工艺试验证实,引起两种铸钢的晶间脆性的主要原因是AlN沿初生奥氏体晶界和枝晶间的沉淀,而H,O,N,C等杂质元素的偏聚促进了这种脆性现象的发生。
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