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Design and Experiments of Microplasma Reactor for Scanning Plasma Etching
Author(s): 
Pages: 222-226
Year: Issue:  3
Journal: NANOTECHNOLOGY AND PRECISION ENGINEERING

Keyword:  微机电系统扫描刻蚀加工微小等离子体反应器伏安特性曲线;
Abstract: 提出了一种新的基于并行探针的扫描等离子体刻蚀加工方法,设计并研制了其中的核心器件--微小等离子体反应器,测量了该器件的伏安特性曲线,分析了其电学性能随工作气压和器件尺寸的变化规律,以及器件损坏的机制.实验结果表明,当放电气体为SF6,工作气压在2 000~6 000 Pa之间变化时,该器件能产生较为稳定的微等离子体,放电电压在390~445 V之间,功率密度在10~150 W/cm2之间,从而为进一步将其应用到扫描硅刻蚀加工提供可能.
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