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The Effects of Substrate Temperature on the Formation and Magnetic Properties of Fe- N Compound Thin Films
Author(s): 
Pages: 24-27
Year: Issue:  1
Journal: ELECTRICAL ENGINEERING MATERIALS

Keyword:  基片温度Fe-N薄膜晶粒取向磁性能;
Abstract: 用 X射线衍射仪和振动样品磁强计研究了双离子束溅射法制备的 Fe- N 薄膜的相组成和磁性能.结果表明,基片温度对不同基片上制得的薄膜的结构和磁性能有显著影响.基片温度为 250℃和 300℃时,在(111)硅片基片上制得无晶粒择优取向的单一γ′- Fe4N相;基片温度为160℃时,可在玻璃基片上制得具有(100)面晶粒取向的单一γ′- Fe4 N 相薄膜.薄膜磁性测量表明,与无晶粒择优取向的γ′- Fe4 N 相比较,具有(100)面晶粒取向的γ′- Fe4 N相的矫顽力较低,易达到磁饱和,但二者的饱和磁化强度基本一致.
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