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Study on the fabrication of sub-nanometer varied-line space gratings
Author(s): 
Pages: 320-322,326
Year: Issue:  3
Journal: OPTICAL TECHNIQUE

Keyword:  衍射光栅变栅距分度亚纳米;
Abstract: 变栅距(VLS)衍射光栅具有自聚焦、像差校正等独特优点.VLS光栅要求的最小栅距变化量为亚纳米数量级,仅靠提高光栅刻划机的分度精度已很难实现,针对这一问题,提出了一种相位扫描方法用于光栅刻划机的变栅距分度控制,即通过对刻划机分度系统的干涉条纹进行微位移扫描来进行相位控制.实验结果表明,相位扫描方法达到了变栅距光栅所要求的亚纳米级的栅距变化精度.
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