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Application and Development Trend of NiPt Alloy Sputtering Target in Semiconductor Manufacturing
Author(s): 
Pages: 87-92
Year: Issue:  3
Journal: Precious Metals

Keyword:  metal materialsnickel platinum alloy filmsnickel platinum silicidesputtering targetsemiconductordeveloping trend;
Abstract: NiPt alloy sputtering targets have been extensively used in semiconductor manufacturing industry. NiPt alloy films were deposited in the given silicon device via magnetron sputtering of NiPt target. And then the films reacted with silicon at certain temperature to form NiPt silicide which undertook the contact and interconnection function in semiconductor manufacturing. The application and the research status of NiPt alloy sputtering target were analyzed in detail and the development trend was proposed based on the above analysis.
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