Synthesis and Characterization of Highly Oriented Anatase-Phased TiO2 Thin Film by Atomic Layer Deposition
Author(s): She Qiuming, Cao Liangliang, Chen Yan, Song Xinshan, Wang Yuhui, Song Zhitang, Wu Liangcai, School of Environmental Science and Engineering, Donghua University, State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information technology, Chinese Academy of Sciences
Pages: 510-514
Year: 2016 Issue: 5
Journal: Chinese Journal of Vacuum Science and Technology
Keyword: ALD; Anatase TiO2; Annealing; Band gap;
Abstract: The highlyoriented,anatase-phased Ti O2 thin filmswere synthesized by atomic layer deposition（ALD） on substrates of silicon and quartz glass. The effect of the annealing temperature in N2 atmosphere on the microstructures,phase-structures and optical properties was investigated with X-ray diffraction,atomic force microscopy,field emission scanning electron microscopy and ultraviolet-visible transmission spectroscopy. The results show that the annealing temperature strongly affects the microstructures and optical bandgap of the ALD anatase-phased Ti O2 thin film. To be specific,an increase of the annealing temperature from 500 to 600℃ roughened the surfaces,increased the grain size,slightly widened the optical bandgap,decreased the transmittance,and blue-shifted the absorption edge of the as-deposited,highly oriented,anatase-phased Ti O2 thin films. Possible mechanisms responsible for the observation were also tentatively discussed.
Pages: 510-514
Year: 2016 Issue: 5
Journal: Chinese Journal of Vacuum Science and Technology
Keyword: ALD; Anatase TiO2; Annealing; Band gap;
Abstract: The highlyoriented,anatase-phased Ti O2 thin filmswere synthesized by atomic layer deposition（ALD） on substrates of silicon and quartz glass. The effect of the annealing temperature in N2 atmosphere on the microstructures,phase-structures and optical properties was investigated with X-ray diffraction,atomic force microscopy,field emission scanning electron microscopy and ultraviolet-visible transmission spectroscopy. The results show that the annealing temperature strongly affects the microstructures and optical bandgap of the ALD anatase-phased Ti O2 thin film. To be specific,an increase of the annealing temperature from 500 to 600℃ roughened the surfaces,increased the grain size,slightly widened the optical bandgap,decreased the transmittance,and blue-shifted the absorption edge of the as-deposited,highly oriented,anatase-phased Ti O2 thin films. Possible mechanisms responsible for the observation were also tentatively discussed.
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