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Synthesis of TiN Coatings by High Power Pulsed Magnetron Sputtering and Its Mechanical Properties
Pages: 1483-1488
Year: Issue:  12
Journal: Vacuum Science and Technology

Keyword:  HPPMSTi NPulse currentMicrostructureMechanical properties;
Abstract: The TiN thin films were deposited by high power pulsed magnetron sputtering( HPPMS) on substrates of high-speed steel. The influence of the deposition conditions,including but not limited to the pulsed current,ratio of N2 and Ar flow-rates,and substrate temperature,on the microstructures and mechanical properties of the TiN coatings were investigated with X-ray diffraction,scanning electron microscopy and conventional mechanical probes. The results show that depending significantly on the pulsed current,the TiN coatings improved the mechanical behavior of the substrates,such as the nano-hardness,Young’s modulus,wear-resistance,friction coefficient and interfacial adhesion. To be specific,as the pulsed current increased,both the hardness and Young; s modulus changed in an increase – decrease mode; the growth-rate and compactness increased. Grown at 20 A,the strongest surface hardness and interfacial adhesion of the TiN coatings,with( 111) preferential growth orientation,were 25 GPa and 70 N,respectively.
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