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Effect of Showerhead Hole Structure on Flow-Field in Large Sized Chemical Vapor Deposition Reactor
Author(s): 
Pages: 1500-1506
Year: Issue:  12
Journal: Vacuum Science and Technology

Keyword:  Vacuum chamberShowerheadDSMCPhysical design;
Abstract: The flow-field,originated from the large-sized showerhead with an array of thousands of holes to supply gases for the plasma enhanced chemical vapor deposition( PECVD) reactor dedicated to fabrication of integrated circuits on 400 ~ 450 mm Si wafers,was approximated,modeled and simulated with the self-developed 2-D direct simulation Monte Carlo( DSMC) code. The influence of the gas flow conditions,including the seven-type inlet / outlet geometries of a hole,pressure at the inlet and temperature,on the distributions of the velocity,pressure and temperature in the reactor chamber,was investigated. The simulated results show that the geometries of the hole’s inlet / outlet significantly affect the flow-field. To be specific,when it comes to satisfactory gas flow-field,the showerhead hole with inverse conical( V-shaped) inlet and outlet outperforms all the other holes at 200 Pa and 300 K. We suggest that the simulated results be of some technological interest for design of large-sized PE CVD and CVD reactor.
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