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Influence of acid additives on textured surface microstructure of multi-crystalline wafer
Pages: 1450-1453
Year: Issue:  10
Journal: Rural Energy

Keyword:  multi-crystalline siliconacid etchadditivesurface texturingreflectance;
Abstract: By applying the isotropic etching method on multi-crystalline silicon,a normal used mixed solution of HNO3 and HF is added some acid additives to improve texturing effect and poly cell efficiency as well. A series of experiments are carried out with different concentrations of acid solvent to study its texturing characteristic. The results show that the etch pits on the surface of multi-crystalline silicon are small and uniform after application of acid additives,which can effectively reduce texturing reflectance and cell discharge. When the proportion of HNO3/HF/acid additives is 8 ∶1 ∶0.4,the reflectance reaches its lowest value while cell efficiency reaches its highest value.
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