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Synthesis and Characterization of Graphene Thin Films by Pulsed Laser Deposition
Pages: 1023-1027
Year: Issue:  8
Journal: Vacuum Science and Technology

Keyword:  PLDGrapheneHRTEMAFM;
Abstract: Graphene with two-dimensional structure has excellent properties,which has become research focus on chemistry,physics,materials science and other fields in recent years. In this paper,the graphene thin films were grown by pulsed laser deposition( PLD) with pyrolytic graphite as the carbon source on Cu( 111) substrate at 2.0 × 10-6Pa and / or at 2. 0 × 10-1Pa of H2. The influence of the deposition conditions,including but not limited to the substrate temperature,hydrogen partial pressure and laser pulse duration,on the microstructures and crystallinity was investigated with atomic force microscopy( AFM) and high resolution transmission electron microscopy( HRTEM),selected area electron diffraction and Raman spectroscopy. The preliminary results show that the substrate temperature and H2 partial pressure have a major impact on the crystallinity of graphene films. To be specific,in the temperature ranging from 400 to 600℃,high quality graphene films were grown at 400℃ and a low pressure of H2.
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