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3D Matching of Scanning Images for CD-AFM
Author(s): Hu Xiaotang, Li Kaikai, Xu Linyan, Hu Xiaodong, Wu Sen, State Key Laboratory of Precision Measuring Technology and Instruments
Pages: 219-
225
Year: 2015
Issue:
3
Journal: Nanotechnology and Precision Engineering
Keyword: critical dimension; atomic force microscope; sidewall topography; 3D image matching;
Abstract: The critical dimension( CD) measurement technique based on atomic force microscope( AFM) can effectively measure the sidewall topography and line width of MEMS structures. A three dimensional( 3D) image matching technique is proposed as one of the generic techniques of CD-AFM for the matching of the upper-surface area and the sidewall area into an entire 3D image. The upper-surface and the sidewall scanning images are obtained by rotating the sample on the sample stage,respectively.Then the image matching points in the overlapping areas of the two images are calculated accurately by image preprocessing and fast correlation matching methods. Finally,a 3D topography image is achieved after such a series of operations on the sidewall image as flipping by columns,cutting,rotating and stitching. The practical images from AFM are matched using the above steps with the algorithm written in C++language. The similarity of two edge curves reaches 97. 62%,showing good accuracy of this algorithm.
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