Author(s): TONG Liang, ZHANG Chao, XU Ming, XU Tao, WEI Bin, ZHANG Jian-hua, School of Materials Science and Engineering, Shanghai University, Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, School of Mechatronic Engineering and Automation, Shanghai University, Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Pages: 259-263
Year: 2013 Issue:  S2
Journal: Journal of Functional Materials
Keyword:  silicon nanopillar arrays; nanosphere lithography; controllable surface structure; antireflection;
Abstract: A fabrication method of controllable sizes and surface structures silicon nanopillar arrays was reported in this paper by the method of nanosphere lithography combining with dry etching.Silica monolayers were fabricated by using Langmuir-Blodgett assembly,which were used as masks.Silicon nanopillar arrays with the controllable sizes and surface structures were then fabricated by using deep reactive ion etching or inductively coupled plasma etching.The samples were characterized by scanning electron microscopy and optical reflectance spectra.The results show that the reflectivity of light was about 5% within the wavelength from 400to 1 000 nm.These Si nanopillar arrays were promising for future applications in photovoltaic.