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yong ji guang tan zhen fa yan jiu cw co2 ji guang dui shen li zi zhu ru gui de tui huo de ji li
Author(s): 
Pages: 662
Year: Issue:  Z1
Journal: Chinese Journal of Lasers

Keyword:  激光探针法固相外延注入硅砷离子离子注入退火过程再结晶退火温度激光退火反射率;
Abstract: <正> 离子注入半导体的激光退火比通常的热处理方法更引人注意。激光处理的主要优点是掺杂原子可以完全电激活,而且不改变注入的空间分布。本工作是用激光探针直接观察和测量CW CO2激光退火过程中固相外延再结晶。砷离子注入硅样品(注入能量150keV,掺杂浓度1015cm-2)放在真空室内退火,照在试样上的CW CO2激光功率用旋转挡光片控制,所以退火温度可以调节,试样温度用热电偶监测并用数字式红外测温仪校准。用He-Ne激光探针直接测量了CW CO2激光退火过程中试
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