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Studies on the microstructure of pulse electrodeposited cobalt-nickel alloy deposits
Author(s): 
Pages: 1-3,13
Year: Issue:  6
Journal: ELECTROPLATING & FINISHING

Keyword:  钴镍合金脉冲电沉积微观结构;
Abstract: 研究了钴镍合金镀液中Co2+浓度与镀层中钴含量的关系,并采用XRD、TEM分析了不同钴含量合金镀层的微观结构.结果表明,沉积层中的钴含量随电解液中Co2+浓度的增大而显著增大,当镀层中的钴含量为69.8%~78.9%(质量分数)时,镀层为面心立方晶格的α-Co相和排六方晶格的ε-Co相组成;钴含量低于69.8%时为α-Co相;钴含量大于78.9%时为ε-Co相.钴含量增大,晶粒尺寸明显减小,合金点阵参数增大.
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