The server is under maintenance between 08:00 to 12:00 (GMT+08:00), and please visit later.
We apologize for any inconvenience caused
Login  | Sign Up  |  Oriprobe Inc. Feed
China/Asia On Demand
Journal Articles
Laws/Policies/Regulations
Companies/Products
Bookmark and Share
she pin ci kong jian she zhi bei sio2 mo
Author(s): 
Pages: 310-316
Year: Issue:  5
Journal: Vacuum Science and Technology

Keyword:  SiO_2 thin fimlsRF magnetron sputteringImpedance matching;
Abstract: 利用石英靶射频磁控溅射制备SiO2膜的工艺,采用L型阻抗匹配网络,并计算得到了等离子体的等效电容及等效电导。指出射频功率密度是最重要的沉积参数,靶面自偏压及SiO2膜沉积速率均随功率密度的增加而线性增加。溅射气压及氧分压对自偏压的影响较小,但两者的增加将导致SiO2沉积速率的降低。制备了可见光区透光性良好,折射率为1.46,沉积速率为35nm/min的SiO2膜。
Related Articles
No related articles found