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zuo shang lv du ceng wei guan biao zheng
Pages: 285-292
Year: Issue:  0
Journal: China Nuclear Science and Technology Report

Keyword:  Be膜层微观结构界面应力;
Abstract: 在铍上制备了等离子喷涂金属铝涂层和磁控溅射离子镀铝镀层。用扫描电镜(SEM)、透射电镜(TEM)、X射线衍射仪(XRD)、俄歇电子能谱仪(AES)以及X射线应力分析仪分析了膜层表面和剖面形貌、膜层微观结构、内应力以及膜与基体界面结构和扩散等。结果表明,磁控溅射离子镀形成了1 μm Be,Al原子共混区,膜层结构均匀,膜层无内应力。等离子喷涂涂层不如前者致密,界面存在微裂纹。
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