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ju jiao li zi shu (fib) ke shi zai guang dian zi qi jian fang mian de ying yong
Author(s): 
Pages: 299-306
Year: Issue:  4
Journal: Vacuum Science and Technology

Keyword:  Focused ion beam (FIB)Maskless etchingOptoelectronic device;
Abstract: There has been an increasing interest in focused ion beam maskless microfabrication technology It includes focused ion beam maskless etching, implantation deposition lithography etc Focused,lithography, ect Focused ion bearm teching is capable of forming optical quality surfaces in semiconductor laser materials This paper describes the characteristics of focused ion beam the and reviews some of the recoent application of focused ion beam etching to optoelectronic devices.
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