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aes ding liang fen xi zhong li zi jian she xiu zheng de shi yan yan jiu
Author(s): 
Pages: 179-183
Year: Issue:  3
Journal: Vacuum Science and Technology

Keyword:  离子溅射实验研究修正因子理论修正增强扩散离子诱导离子轰击俄歇电子谱溅射产额合金溅射;
Abstract: Ion sputtering cleaning of the solid surface is one of the most generally used method in Auger Electron Spectroscopy (AES) analysis. The surface composition changes of the alloys, AgCu, NiCr, CuZn and TiMo, which are bombarded by low energy Ar~+, have been studied by means of AES. The surface compositions are corrected by different correction models. We find that there is a small deviation in the correction result by using the Shimizu's correction model and the Sigmund's sputtering yield ratio relationship under the condition of reducing the ion induced segregation and enhancing the deffusion effects. The difference of the theoreticnl sputtering correction results and the experimental results are discussed.
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