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Structural Analysis of RF Magnetron Sputtered CdTe Films
Author(s): 
Pages: 627-629
Year: Issue:  11
Journal: INFRARED TECHNOLOGY

Keyword:  射频磁控溅射非晶CdTe薄膜XRD卢瑟福散射理论;
Abstract: 采用射频磁控溅射技术在玻璃衬底上沉积了CdTe单层薄膜,实验表明:在室温条件下,通过调节溅射功率和溅射氩气压强,沉积的CdTe薄膜显示了一系列结构形态.研究了无CdTe薄膜沉积、非晶CdTe薄膜沉积、晶化CdTe薄膜沉积的生长条件,并采用卢瑟福散射理论解释了溅射CdTe薄膜生长机制的分子动力学过程.
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