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quan gan guang ke gong yi wei qun ji ji shu pu ping dao lu
Pages: 25
Year: Issue:  3
Journal: Laser & Optoelectronics Progress

Keyword:  光刻工艺群集技术液体光致抗蚀剂半导体片有机硅随机存取存储器分辨率准分子激光平道衬底温度;
Abstract: 全干光刻工艺为群集技术铺平道路贝尔实验室发展的一种全干光刻工艺可使制作在半导体片上的器件结构和电路图发生革命。该工艺以气体反应淀积光敏膜法代替液体光致抗蚀剂膜的普通方法。研制者T.Weidman说,该工艺较简单,适于现行处理技术,并有0.25urn的...
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