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Research of Dry Technology of Germanium Polished Wafers
Author(s): 
Pages: 114-117
Year: Issue:  2
Journal: Electronics Process Technology

Keyword:  Isopropyl alcohol dryingWet cleaningSurface contamination;
Abstract: 在锗加工工艺中,干燥技术对于加工的成品率和抛光片表面质量有着重要的影响。介绍了异丙醇脱水干燥技术的原理,分析了异丙醇脱水技术对超薄锗抛光片的适用性。采用湿法清洗技术,有效去除了表面沾污和抛光后的表面氧化产物,控制了抛光片表面GeO_2的生成。采用异丙醇脱水技术成功实现了140μm厚锗抛光片的干燥。
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