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Thermal Stability of C/C Multi-Layers
Author(s): 
Pages: 557-560
Year: Issue:  6
Journal: Journal of Vacuum Science and Technology

Abstract: 采用磁过滤直流阴极真空弧源沉积技术,通过改变基体偏压,在单晶Si片和0Cr19Ni9基体表面制备了C/C多层类金刚石薄膜.为了考察多层膜的热稳定性,对薄膜进行了300~C及400~C退火处理,采用x射线光电子能谱、硬度实验及摩擦磨损性能测试分析了退火对薄膜结构及性能的影响.结果表明在400~C范围内多层膜具有较高的热稳定性.
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