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Simulation and Optimization of Cylindrical Microwave Plasma Reactor for CVD Diamond Fihn Growth
Author(s): 
Pages: 516-521
Year: Issue:  6
Journal: Journal of Vacuum Science and Technology

Abstract: 微波等离子体化学气相沉积(MPCVD)技术被认为是制备高质量金刚石膜的一种最重要的技术手段.对微波等离子体金刚石膜沉积装置进行模拟与优化,可大大减少设计和改进MPCVD装置时所需要的时间与成本.本文在结合使用谐振腔质量因子和沉积台上方等离子体的密度与分布两个优化判据的基础上,采用Matlab语言和时域有限差分方法,模拟了圆柱谐振腔式微波等离子体金刚石膜沉积装置,并对其主要尺寸进行了优化.
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