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Influence of Sputtering Pressure on Permeability of FeSi_3N_4 Multilayered Films
Pages: 22-27
Year: Issue:  1
Journal: Vacuum Science and Technology

Keyword:  溅射气压 多层膜 磁控溅射 磁导率;
Abstract: 在不同的溅射气压下,采用连续磁控溅射制备了Fe/Si3N4多层膜,探讨了溅射气压对多层膜微波磁性的影响。研究发现,溅射气压影响着多层膜的沉积速率和微结构,在溅射铁子层时,Ar气流量控制在300sccm~400sccm下,在溅射氮化硅子层时,氩气与氮气的流量控制在2∶1,总流量控制在320sccm时制备得到的多层膜具有最好的磁性能。
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