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Microstructure Studies of Nb/Si Multilayers Deposited at Room Temperature and 560 ℃
Author(s): 
Pages: 78-82
Year: Issue:  2
Journal: Vacuum Science and Technology

Keyword:  Nb/Si多层膜 沉积温度 界面结构;
Abstract: 对多靶离子溅射制备的Nb/Si周期多层膜的微结构进行了实验研究。利用X射线衍射和截面透射电子显微镜观测到室温和 56 0℃沉积的Nb/Si多层膜为非晶多层膜 ,但它们的微结构有很大的不同。采用沉积原子表面活动性和界面反应程度解释了所得到的结果。
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