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Photoluminescence of Amorphous Si Films Prepared by Atmospheric Pressure Chemi cal Vapor Deposition
Author(s): 
Pages: 69-71
Year: Issue:  6
Journal: Vacuum Science and Technology

Keyword:  光致发光 非晶硅 Raman XPS;
Abstract: 使用改进的常压化学气相沉积 (APCVD)系统制备了非晶硅薄膜 ,测量了样品的光致发光特性 ,使用Raman光谱和X射线光电子能谱 (XPS)谱测量了薄膜的微结构特征。样品在 5 2 3nm出现发光峰 ,Raman光谱和XPS谱表明制备的薄膜结构中存在富氧相和富硅相的分相现象 ,分析认为相界面的存在是产生发光的原因。Raman光谱分峰结果表明薄膜中存在纳米晶粒。
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