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SiO_x Superhydrophobic Coatings Deposited by Cold Plasma Arc at Atmospheric Pressure
Author(s): 
Pages: 68-71
Year: Issue:  1
Journal: Vacuum Science and Technology

Keyword:  冷等离子体弧 超疏水表面 大气压 SiOx薄膜;
Abstract: 采用冷等离子弧在大气压下以六甲基二硅氧烷为单体制备SiOx超疏水薄膜,研究不同工艺参数对薄膜的结构性能影响。通过傅里叶红外光谱(FTIR)对SiOx薄膜进行了结构分析、通过原子力显微镜(AFM)和数字光学显微镜分析了SiOx薄膜的表面形貌、通过接触角仪测试了所沉积的SiOx薄膜亲/疏水性。在较为详细的研究冷等离子弧制备工艺参数对薄膜的影响后,如基片高度、单体输入量、沉积时间等,我们得到,在基片高度为10cm、单体输入量为90mL.min-1、沉积时间为2min时,可以制备出接触角为160°以上的SiOx超疏水表面。
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