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Microstructures of IrO_2 Films Deposited by Pulsed Laser Deposition
Author(s): 
Pages: 425-428
Year: Issue:  5
Journal: Vacuum Science and Technology

Keyword:  IrO2薄膜 基片温度 微观结构 脉冲激光沉积技术;
Abstract: 采用脉冲激光沉积技术,在Si(100)基片上制备了高致密的氧化铱(IrO2)薄膜,研究了不同沉积温度对薄膜结构的影响。利用X射线衍射(XRD)、拉曼光谱、扫描电镜(SEM)和原子力显微镜(AFM)对制备的IrO2薄膜进行了表征。结果表明:在20 Pa氧分压,250℃~500℃范围内,得到的薄膜为多晶的IrO2物相,其晶粒尺寸和粗糙度随着沉积温度的升高而增加;所得到的IrO2薄膜表面粗糙度低,厚度均匀,与基片结合良好。
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