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Improved Design of Uniformity Mask for Flat Planetary Fixture
Author(s): 
Pages: 286-289
Year: Issue:  4
Journal: Vacuum Science and Technology

Keyword:  光学薄膜 平面行星夹具 修正挡板设计 停留概率修正法;
Abstract: 众多光学系统对其关键环节大尺寸多层光学薄膜提出了越来越复杂的光谱要求,相应地对各个单层膜的厚度容差要求越来越严格。在整个基底表面,每一层都需要沉积得相当均匀。因为,任何单层的非均匀性将增加最终的膜厚误差。随着平面行星夹具广泛地应用于大尺寸光学薄膜制备,必须实现对行星夹具的均匀性有效控制。本文建立了平面行星夹具薄膜沉积无量纲模型,通过对夹具上各点的运动轨迹分析,提出了停留概率修正法,获得的理论均匀性与实验结果吻合。用此法设计出单片修正挡板将夹具560 mm范围内的不均匀性从4%改进到6‰。
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