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zhen kong mie hu shi fa zhan xin qu shi
Author(s): 
Pages: 16
Year: Issue:  4
Journal: Electrical Manufacturing

Abstract: 人类从事将真空作为灭弧和绝缘介质的应用研究,到现在已有100多年的历史.真空灭弧室自问世以来,一直任向小型化、高可靠性及低成本方向发展,随着真空断路器应用范围的扩大,真空灭弧室有了更新的发展趋势.……
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