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Double photo-diodes with STI
Author(s): 
Pages: 24-25,39
Year: Issue:  4
Journal: ELECTRONIC MEASUREMENT TECHNOLOGY

Keyword:  双光电探测器浅沟槽隔离器件模拟响应度;
Abstract: 提出一种新型光电探测器,采用浅沟槽隔离工艺,在双光电探测器基础上制作而成.通过使用Silvaco公司的器件模拟软件Atlas进行器件模拟,分析了浅沟槽对探测器关键参数的影响,包括响应度和响应速度.结果表明,浅沟槽双光电探测器具有良好的特性,响应度和响应速度都优于双光电探测器.
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