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Analysis of residual stress of gradient TiAlN films prepared by arc ion plating
Author(s): 
Pages: 100-103
Year: Issue:  3
Journal: TRANSACTIONS OF MATERIALS AND HEAT TREATMENT

Keyword:  电弧离子镀(TiAl)N梯度薄膜残余应力;
Abstract: 采用电弧离子镀膜技术在1Cr11Ni2W2MoV不锈钢表面沉积了Ti1-xAlxN/Ti梯度薄膜.在700℃和800℃进行了高温氧化实验.对梯度薄膜常温和高温下的残余应力分布及薄膜和基体的结合状态进行了研究.研究结果表明,由于膜层是成分分别为Ti、TiN、Ti0.75 Al0.25 N、Ti0.6 Al0.4N和Ti0.5 Al0.5N梯度层组成,实现了成分和结构的梯度变化,各单层之间以及薄膜和基体之间的热膨胀系数不匹配程度降低,晶格错配度下降,薄膜中的残余应力降低;高温下,本征应力松弛,热应力转变为拉应力,薄膜和基体仍能维持较好的结合状态.
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